The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi2O3 co-doped LiNbO3 crystals
- Author(s)
- Dahuai Zheng, Yongfa Kong, Shiguo Liu, Muling Chen, Shaolin Chen, Ling Zhang, Romano Rupp, Jingjun Xu
- Abstract
For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi2O3 co-doped LiNbO3 (LN:Bi,Mg). The photorefractive response time of LN:Bi, Mg was shortened to 170 ms while the photorefractive sensitivity reached up to 21 cm(2)/J. Meanwhile, LN:Bi, Mg crystals could withstand a light intensity higher than 10(6) W/cm(2) without apparent optical damage. Our experimental results indicate that photorefraction doesn't equal to optical damage. The underground mechanism was analyzed and attributed to that diffusion dominates the transport process of charge carriers, that is to say photorefraction causes only slight optical damage under diffusion mechanism, which is very important for the practical applications of photorefractive crystals, such as in holographic storage, integrated optics and 3D display.
- Organisation(s)
- Physics of Functional Materials
- External organisation(s)
- Nankai University, Collaborative Innovation Center of Chemical Science and Engineering (Tianjin)
- Journal
- Scientific Reports
- Volume
- 6
- No. of pages
- 7
- ISSN
- 2045-2322
- DOI
- https://doi.org/10.1038/srep20308
- Publication date
- 02-2016
- Peer reviewed
- Yes
- Austrian Fields of Science 2012
- 103021 Optics, 103018 Materials physics
- Keywords
- Portal url
- https://ucris.univie.ac.at/portal/en/publications/the-simultaneous-enhancement-of-photorefraction-and-optical-damage-resistance-in-mgo-and-bi2o3-codoped-linbo3-crystals(36415585-c2c6-46b4-a0b0-7865107228d0).html