The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi2O3 co-doped LiNbO3 crystals

Authors/others:Zheng, Dahuai (Nankai University); Kong, Yongfa (Nankai University); Liu, Shiguo (Nankai University); Chen, Muling (Nankai University); Chen, Shaolin (Nankai University); Zhang, Ling (Nankai University); Rupp, Romano (Nankai University); Xu, Jingjun (Nankai University)
Abstract:For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi2O3 co-doped LiNbO3 (LN:Bi,Mg). The photorefractive response time of LN:Bi, Mg was shortened to 170 ms while the photorefractive sensitivity reached up to 21 cm(2)/J. Meanwhile, LN:Bi, Mg crystals could withstand a light intensity higher than 10(6) W/cm(2) without apparent optical damage. Our experimental results indicate that photorefraction doesn't equal to optical damage. The underground mechanism was analyzed and attributed to that diffusion dominates the transport process of charge carriers, that is to say photorefraction causes only slight optical damage under diffusion mechanism, which is very important for the practical applications of photorefractive crystals, such as in holographic storage, integrated optics and 3D display.
Language:English
Number of pages:7
Date of publication:3.2.2016
Journal title:Scientific Reports
Volume:6
Peer reviewed:true
Links:
Digital Object Identifier (DOI):http://dx.doi.org/10.1038/srep20308
Publication Type:Article
Portal:https://ucris.univie.ac.at/portal/en/publications/the-simultaneous-enhancement-of-photorefraction-and-optical-damage-resistance-in-mgo-and-bi2o3-codoped-linbo3-crystals(36415585-c2c6-46b4-a0b0-7865107228d0).html